Description of the infrastructure:

Equipment for the determination of the optical constants of materials, both massive and thin films, in the range between 190 nm and 3200 nm wavelength. In the last case, it allows the determination of thicknesses with Angstrom resolution and the realization of topographic maps of surfaces up to 5 cm x 5 cm, with a lateral resolución of up to 100 microns. The equipment also allows carrying out transmittance, reflectance and scatterometry measurements of the studied samples.

Services currently offered and possible applications in other fields:

• Determination of n, k and dielectric constant (real and imaginary) of materials in the range of 190 nm to 3200 nm.
• Determination of thin film thicknesses between 50 nm to several microns (depending on the material).
• Realization of topographic profiles of surfaces up to 5 cm x 5 cm with a lateral resolution of up to 100 microns and depth down to 0.1 nm.
• Reflectometry and specular finish measurements.
• Refection and transmission spectrum with polarized light.

Is it necessary to use a technician: yes.  Have a technician: no

Observations

The measurement time depends on the desired spectral range and resolution.